METHOD FOR MANUFACTURING TRANSPARENT CONDUCTIVE FILM

Title:

METHOD FOR MANUFACTURING TRANSPARENT CONDUCTIVE FILM

Document Type and Number:

Japanese Patent JP2013069679

Kind Code:

A

Abstract:

To provide a method for manufacturing a transparent conductive film, capable of shortening a heating time for crystallizing an amorphous layer including indium based composite oxide.

A method for manufacturing a transparent conductive film according to the present invention includes: a first step of laminating an amorphous layer formed of indium based composite oxide on a first face of a film base material having a thickness of 10-50 μm; a second step of, during transporting the film base material having the amorphous layer laminated thereon by means of a supply roller to wind around a take-up roller, heating the film base material up to 160°C or above and crystallizing the amorphous layer to form a transparent conductive layer; and a third step of forming an adhesive layer on a second face of the film base material.

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Inventors:

YAMAZAKI YUKA
NASHIKI TOMOTAKE

Application Number:

JP2012194616A

Publication Date:

April 18, 2013

Filing Date:

September 04, 2012

Export Citation:

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