Title:
METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK
Document Type and Number:
Japanese Patent JP2023071013
Kind Code:
A
Abstract:
To provide a method for manufacturing a vapor deposition mask that is improved in location accuracy of an opening region.SOLUTION: A method for manufacturing a vapor deposition mask includes the steps of: forming a photoresist layer, in which a predetermined pattern is formed, on a support substrate via a base metal layer; disposing the support substrate so as to position a first surface of the support substrate perpendicular to a horizontal plane and measuring a first warpage of the support substrate; forming a mask body by precipitating a metal by electroforming in a region where the photoresist layer is not formed in the base metal layer; disposing the support substrate so as to position the first surface of the support substrate perpendicular to a horizontal plane and measuring a second warpage of the support substrate; and calculating a shrinkage rate of the mask body on the basis of a change amount of warpage calculated on the basis of the first warpage and the second warpage as well as internal stress of the support substrate calculated on the basis of the change amount of warpage.SELECTED DRAWING: Figure 3
Inventors:
FUKUDA KAICHI
Application Number:
JP2021183562A
Publication Date:
May 22, 2023
Filing Date:
November 10, 2021
Export Citation:
Assignee:
JAPAN DISPLAY INC
International Classes:
C23C14/04; C23C14/24; C25D1/10
Attorney, Agent or Firm:
Patent Attorney Corporation Takahashi Hayashi and Partners