METHOD FOR MANUFACTURING WATER-REPELLENT BASE MATERIAL AND PHOTO PROCESSING BASE MATERIAL

Title:

METHOD FOR MANUFACTURING WATER-REPELLENT BASE MATERIAL AND PHOTO PROCESSING BASE MATERIAL

Document Type and Number:

Japanese Patent JP2007275742

Kind Code:

A

Abstract:

To provide a method for manufacturing a water-repellent base material constituted by forming a water-repellent thin film on a base material etc., and to provide a method for manufacturing a photo processing base material having a hydrophilic region and water-repellent region of high contrast by a decomposition reaction using light of relalatively low energy.

The method for manufacturing the water-repellent base material comprises applying a compound expressed by general formula (1) on the surface of the base material and forming the water-repellent thin film on the surface of the base material. In the formula, R1, R2, R3, and R4each independently denote a hydrogen atom or monovalent group, and at least one of the four groups denotes a water-repellent monovalent organic group. R5denotes a hydrogen atom or a monovalent hydrocarbon group.

Inventors:

HOSHINO YASUTERU

Application Number:

JP2006104410A

Publication Date:

October 25, 2007

Filing Date:

April 05, 2006

Export Citation:

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Assignee:

ASAHI GLASS CO LTD

International Classes:

B05D7/24; C07C245/14; C08J7/12; C09K3/18

Attorney, Agent or Firm:

Shohei Oguri
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu

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