Title:
METHOD FOR MEASURING IMAGING CHARACTERISTICS, AND EXPOSURE METHOD
Document Type and Number:
Japanese Patent JP2004079585
Kind Code:
A
Abstract:
To improve measuring capabilities in the measurement of projection optical system imaging characteristics.
The number of lines in a line and space pattern to be transcribed to a wafer is changed from 5 to 2 in this method for measuring imaging characteristics such as comatic aberration. This reduces the effect of defocusing of line widths or the like in the line pattern to be imaged on the wafer and also decreases the effect of reticle formation errors or the like, and enables a high-precision measurement of projection optical system imaging characteristics.
Inventors:
SAKASAI SHIGEO
KAISE KOJI
KAISE KOJI
Application Number:
JP2002233975A
Publication Date:
March 11, 2004
Filing Date:
August 09, 2002
Export Citation:
Assignee:
NIKON CORP
International Classes:
G01M11/02; G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G01M11/02; G03F7/20
Attorney, Agent or Firm:
Atsushi Tateishi