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Title:
METHOD FOR MEASURING REFLECTION HIGH-ENERGY ELECTRON DIFFRACTION PATTERN FROM WHICH INELASTIC SCATTERED COMPONENT IS ELIMINATED
Document Type and Number:
Japanese Patent JPH0989815
Kind Code:
A
Abstract:

To obtain a method for observing, measuring, or displaying a reflection high-energy electron diffraction pattern by eliminating inelastic scattered electrons from a reflection high-speed electron diffraction pattern and causing only elastic scattered electrons to reach a fluorescent screen in the reflection high-speed electron diffraction method.

In the reflection high-energy electronic diffraction method, an energy filter 4 is inserted while electrons emitted from an electron gun 1 are reflected from the surface of a sample 2 and projected to a fluorescent screen 3. A rejection voltage as a threshold is applied to a grid at the center of the filter, in elastic scattered electrons are eliminated, the elastic scattered electrons are projected on the fluorescent screen, a diffraction pattern projected by it is observed by a monitor camera 7, and the pattern intensity and background behavior are measured by the computer of a control system 8.


Inventors:
HORIO YOSHIMI
Application Number:
JP26801995A
Publication Date:
April 04, 1997
Filing Date:
September 22, 1995
Export Citation:
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Assignee:
UNIV NAGOYA
International Classes:
G01N23/20; H01Q15/02; (IPC1-7): G01N23/20; H01Q15/02
Domestic Patent References:
JPH07218454A1995-08-18
Attorney, Agent or Firm:
Akihide Sugimura (5 outside)