Title:
METHOD FOR MEASURING REGISTRATION PRECISION AND MARK TO BE USED BY THE SAME METHOD
Document Type and Number:
Japanese Patent JP3715485
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To measure the registration precision of a resist pattern to a reference layer (a resist pattern formed through a thin film on the reference layer) with high precision.
SOLUTION: A registration precision measurement mark is constituted of a reference mark 10 and an overlap mark 20. Dummy patterns (patterns which are not used for measurement) 3 and 4 are formed inside and outside the reference pattern 11 as the reference mark 10. Then, the projecting part of a thin film formed at the upper part of the reference pattern 11 is considered as a reference pattern, and intervals x1 and x2 between the outside line of the reference pattern 11 and the inside line of a registration pattern 21 corresponding to this are measured.
Inventors:
Kenzo Kamidai
Application Number:
JP31942299A
Publication Date:
November 09, 2005
Filing Date:
November 10, 1999
Export Citation:
Assignee:
Asahi Kasei Microsystem Co., Ltd.
International Classes:
H01L21/027; G03F7/20; G03F9/00; H01L21/66; (IPC1-7): H01L21/66; G03F9/00; H01L21/027
Domestic Patent References:
| JP10125751A | ||||
| JP4064217A | ||||
| JP3089530A | ||||
| JP1186617A |
Attorney, Agent or Firm:
Tetsuya Mori
Yoshiaki Naito
Cui Shu Tetsu
Yoshiaki Naito
Cui Shu Tetsu
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