Title:
METHOD FOR MEASURING STATE OF PATTERN-DRAWING IN VARIABLE AREA TYPE CHARGED PARTICLE BEAM LITHOGRAPHIC APPARATUS
Document Type and Number:
Japanese Patent JP3886837
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method by which the drawing precision of a pattern to be drawn succeeding to a certain drawing pattern can be known simply in a short time before drawing when patterns of different dimensions are drawn on a material on which a pattern is drawn.
SOLUTION: A beam having a sectional dimension in accordance with the dimension of a pattern A is formed, a member having an edge is scanned by the beam, and a signal waveform obtained by the scanning is stored. A beam having a sectional dimension in accordance with the dimension of a pattern B is formed, a member having an edge is scanned by the beam, and a signal waveform obtained by the scanning is stored. Next, after the starting positions of the two signal waveforms are made to coincide with each other, the two signal waveforms are added. Next, the dimension from one edge to the other of the patterns A and B as a whole is calculated based on the inflection point of the added signal waveform.
Inventors:
Kimura Norio
Application Number:
JP2002099915A
Publication Date:
February 28, 2007
Filing Date:
April 02, 2002
Export Citation:
Assignee:
JEOL Ltd.
International Classes:
G03F7/20; H01L21/027; H01J37/09; H01J37/147; H01J37/305; (IPC1-7): H01L21/027; G03F7/20; H01J37/09; H01J37/147; H01J37/305
Domestic Patent References:
| JP11243047A | ||||
| JP9259804A | ||||
| JP7142330A |
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