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Title:
METHOD FOR OXYNITRIDING QUARTZ GLASS AND SURFACE TREATMENT
Document Type and Number:
Japanese Patent JPH0753242
Kind Code:
A
Abstract:

PURPOSE: To provide a method for oxynitriding quartz. glass and a method for treating its surface by which the oxynitriding treatment of the surface can be easily and rapidly carried out at a relatively low temp. and the peeling of a formed surface layer due to repeated heat cycles is not caused.

CONSTITUTION: Quartz glass to be treated is heated at 700-1,200°C in an atmosphere of a gaseous ammonia-hydrocarbon mixture or in an atmosphere of gaseous ammonia in which solid carbon exists to form a silicon oxynitride film on the surface of the quartz glass. The oxynitrided surface of the quartz glass is coated with a silicon nitride film, e.g. by CVD.


Inventors:
Yamaoka, Shusuke
Kurono, Nobuhisa
Kotaka, Hiroaki
Matsuo, Hideyasu
Aiba, Yoshiro
Application Number:
JP1993000217086
Publication Date:
February 28, 1995
Filing Date:
August 09, 1993
Export Citation:
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Assignee:
TOSHIBA CERAMICS CO LTD
International Classes:
C03C17/23; C03C17/22; C03C17/34; C04B41/87; (IPC1-7): C03C17/23; C04B41/87
Attorney, Agent or Firm:
赤野 牧子 (外1名)