Title:
METHOD FOR POSITIONING OF CYLINDRICAL BASE MATERIAL
Document Type and Number:
Japanese Patent JP3778197
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for positioning which positions a cylindrical base material with high precision to minimize fluctuations in film pressure and uniformly and efficiently coat a processing liquid when coating the processing liquid on a surface of the cylindrical base material, and does not generate coating failures without damaging the cylindrical base materials when continuously coating the processing liquid on many cylindrical base materials.
SOLUTION: In the method for positioning the cylindrical base material, in a process step of continuously coating the coating liquid on outer peripheral surfaces of the cylindrical base materials by a vertically coating device while combining and overlaying cylindrical shafts of two or more cylindrical base materials and vertically elevating from lower parts to upper parts, the positioning of the cylindrical base materials is performed at an uncoated or a coated position by a positioning means in which an annular coating means having ejecting ports for spraying liquids toward the outer peripheral surfaces of the cylindrical base materials is coaxially arranged to the the cylindrical base materials, and it is characterized in that a tapered portion is provided on a guiding part of the positioning means.
Inventors:
Akira Ohira
Junji Ujihara
Eiichi Kijima
Junji Ujihara
Eiichi Kijima
Application Number:
JP2003373918A
Publication Date:
May 24, 2006
Filing Date:
November 04, 2003
Export Citation:
Assignee:
Konica Minolta Holdings Co., Ltd.
International Classes:
B05D3/00; G03G5/05; B05C3/02; G03G5/00; G03G5/10; (IPC1-7): G03G5/05; B05D3/00; G03G5/00; G03G5/10
Domestic Patent References:
| JP3280063A | ||||
| JP8318189A | ||||
| JP3588727B2 |