Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
METHOD FOR POSTPROCESSING CHLOROSILANE DISTILLATION RESIDUE
Document Type and Number:
Japanese Patent JPH05279010
Kind Code:
A
Abstract:

PURPOSE: To provide the method for economically postprocecssing residues produced by the distillation of chlorosilane and discharging only a fine amount of solid together with a gas stream exiting from a hydrolysis reactor.

CONSTITUTION: In the case of executing hydrolysis continuously, hydrolysis is stated at a temperature of ≤160°C and finished at a temperature of ≥170°C and when hydrolysis is performed on a batch basis, the dry residues are introduced into the hydrolysis reactor whose entrance temperature is at least 5°C lower than drying temperature and steam is supplied when heating up to the hydrolysis temperature.


Inventors:
Claus Ruff
Application Number:
JP24456892A
Publication Date:
October 26, 1993
Filing Date:
September 14, 1992
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Hiyurus Actien Gezershyaft
International Classes:
A62D3/35; C01B33/107; A62D101/22; (IPC1-7): C01B33/107
Attorney, Agent or Firm:
Toshio Yano (2 outside)



 
Previous Patent: JPS5279009

Next Patent: 照明装置及び電子機器