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Title:
METHOD FOR PREPARING THICK-FILM RESIN PATTERN AND THICK- FILM RESIN PATTERN
Document Type and Number:
Japanese Patent JP2001293429
Kind Code:
A
Abstract:

To provide a method for preparing a resin pattern having a sufficient thickness more conveniently.

This method for preparing a thick-film resin pattern includes a stage for forming patterned through-holes to a heat-resistant film to form a printing mask and a stage for filling a resin consisting of paint or ink in the through-holes of the mask and curing the resin. Preferably, patterned through-holes are provided to form a printing mask, a supporting film is stuck on one side of the mask, a resin consisting of paint or ink is filled in the through-holes from the exposed side of the mask, the resin is cured, then an adhesive layer is formed on the exposed side of the cured resin, the whole or a part of the mask is removed, as required, and the cured resin is adhered to an adhered through the adhesive layer.


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Inventors:
NAKAYAMA HAJIME
Application Number:
JP2000110932A
Publication Date:
October 23, 2001
Filing Date:
April 12, 2000
Export Citation:
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Assignee:
TEFUKO INTERNAT KK
International Classes:
G04B19/10; B05D1/32; B05D5/06; B05D7/24; B29C59/02; B44C3/02; B44C7/04; B44F1/14; B44F11/00; G04B19/00; G04B19/06; G04B19/32; G04D3/00; G09F23/16; H01L21/02; (IPC1-7): B05D5/06; B05D1/32; B05D7/24; B44C3/02; B44C7/04; G04B19/10; G09F23/16
Attorney, Agent or Firm:
Shunichiro Suzuki (3 others)