Title:
METHOD FOR PRODUCING 2-METHYL-2-ADAMANTYL (METH)ACRYLATE
Document Type and Number:
Japanese Patent JP2007314471
Kind Code:
A
Abstract:
To provide a method for producing 2-methyl-2-adamantyl (meth)acrylate suitable as a monomer for photoresist resin in high reproducibility and high yield.
2-Methyl-2-adamantyl (meth)acrylate is produced by reacting a 2-methyl-2-adamantanol magnesium halide salt or 2-methyl-2-adamantanol with (meth)acrylic acid anhydride. The (meth)acrylic acid anhydride contains an impurity expressed by general formula (1) in an amount of ≤5 mol%.
COPYRIGHT: (C)2008,JPO&INPIT
Inventors:
OKAGO YUJI
KUSAKA HARUHIKO
KUSAKA HARUHIKO
Application Number:
JP2006145960A
Publication Date:
December 06, 2007
Filing Date:
May 25, 2006
Export Citation:
Assignee:
MITSUBISHI CHEM CORP
International Classes:
C07C67/08; C07C51/573; C07C57/04; C07C69/013; C07C69/653
Attorney, Agent or Firm:
Tetsuro Hoshino
Akihiko Yamashita
Kishimoto Tatsuto
Akihiko Yamashita
Kishimoto Tatsuto
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