To provide a method for producing an alkoxycarbonylfluoroalkanesulfonic acid salt which is useful as a photoacid generator and an intermediate thereof constituting a chemical amplification resist material suitably used in the microfabrication technique, particularly in photolithography to be employed in the process for manufacturing a semiconductor device and the like under mild conditions by simple operations in a good yield with high purity as well.
The target alkoxycarbonylfluoroalkanesulfonic acid salt is obtained by using a halofluoroalkanoic acid ester as a starting raw material, sulfinating the ester in the presence of an amine (step 1), and then oxidizing the resulting product (step 2). Furthermore, by salt exchanging the thus-obtained alkoxycarbonylfluoroalkanesulfonic acid salt (step 3), an alkoxycarbonylfluoroalkanesulfonic acid onium salt which is useful as a photoacid generator is obtained.
COPYRIGHT: (C)2010,JPO&INPIT
TAKIBANA RYOZO
FUSHIMI MASANORI
ISONO YOSHIMI
NARIZUKA SATOSHI
| JP2008094835A | 2008-04-24 | |||
| JP2008133262A | 2008-06-12 |