METHOD FOR PRODUCING ALMOST SPHERICAL SILICON POWDER, AND ALMOST SPHERICAL SILICON POWDER

Title:

METHOD FOR PRODUCING ALMOST SPHERICAL SILICON POWDER, AND ALMOST SPHERICAL SILICON POWDER

Document Type and Number:

Japanese Patent JP2015040150

Kind Code:

A

Abstract:

PROBLEM TO BE SOLVED: To produce almost spherically controlled silicon powder with high reproducibility in the method for producing silicon by a zinc reduction method.SOLUTION: Provided is a method for producing spherical silicon powder, including a step of reacting a zinc gas and a silicon tetrachloride gas in the presence of an oxygen source gas to produce, in which the oxygen source gas is fed in an amount to form into 2×10to 2×10expressed in terms of oxygen atoms to 1 mol of the zinc gas.

More Like This:

WO/2024/027952	OPTIMIZED PROCESS FOR SILICON DEPOSITION
WO/2009/110474	PROCESS FOR PRODUCING SILICON AND APPARATUS FOR PRODUCING SILICON
WO/2008/127120	PROCESS AND EQUIPMENT FOR REACTING SILICON TETRACHLORIDE WITH ZINC TO PRODUCE PURE SILICON AND ZINC CHLORIDE

Inventors:

SATO KENJI
SHIMOGUCHI TAKESHI
NAKAJIMA KOICHI
KAWAI TAKAHIRO

Application Number:

JP2013172400A

Publication Date:

March 02, 2015

Filing Date:

August 22, 2013

Export Citation:

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Assignee:

JNC CORP
JX NIPPON MINING & METALS CORP
TOHO TITANIUM CO LTD

International Classes:

C01B33/033; H01L31/06

Domestic Patent References:

JP2007123100A	2007-05-17
JP2009107896A	2009-05-21
JP2004288644A	2004-10-14
JP2012116729A	2012-06-21
JP2007145663A	2007-06-14

Foreign References:

WO2008153181A1

2008-12-18

Attorney, Agent or Firm:

Patent business corporation SSINPAT

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