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Title:
METHOD FOR PRODUCING AMINE DERIVATIVE
Document Type and Number:
Japanese Patent JP2003201268
Kind Code:
A
Abstract:

To provide a method for producing a substituted aromatic amine compound in high yield while suppressing the formation of impurities.

An amine derivative expressed by general formula (3): R2R3NR1 (R1 is an aryl, a heteroaryl, an alkenyl or a cycloalkenyl; R2 is H or a (substituted)alkyl; and R3 is H, an alkyl, a cycloalkyl or an aryl or R2 and R3 together with a nitrogen atom form a heterocyclic group) is produced by the condensation reaction of an unsaturated organic compound of general formula (1): R1X1n (X1 is Cl, Br, I, mesyl or trifluoromethanesulfonyl; and (n) is an integer of 1-3) with an amine compound of general formula (2): R2R3NH in the presence of a catalyst composed of a complex of 1,2- bis(dicyclohexylphoshino)ethane or 1,3-bis(dicyclohexylphosphino)propane and a nickel compound.


Inventors:
ITABASHI TAMON
KAMIKAWA TAKU
Application Number:
JP2002311248A
Publication Date:
July 18, 2003
Filing Date:
October 25, 2002
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D213/74; C07B61/00; C07C209/10; C07C211/48; C07C211/54; C07C217/84; C07C227/08; C07C229/60; C07C253/30; C07C255/58; (IPC1-7): C07C209/10; C07C211/48; C07C211/54; C07C217/84; C07C227/08; C07C229/60; C07C253/30; C07C255/58; C07D213/74
Attorney, Agent or Firm:
Takashi Kuboyama (2 outside)



 
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