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Patent Searching and Data


Title:
METHOD FOR PRODUCING AQUEOUS PHOTOPOLYMERIZABLE RESIN COMPOSITION AND AQUEOUS PHOTOPOLYMERIZABLE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2004067902
Kind Code:
A
Abstract:

To obtain an aqueous photopolymerizable resin composition improved in odor of a solvent, storage stability and coloring and excellent in curing properties, a pattern-forming property, etching resistance and release resistance of a cured product.

A method for producing the aqueous photopolymerizable resin composition comprises polymerizing an ethylenic unsaturated carboxylic acid used as an essential monomer component in the presence of a solvent composed of sec-butyl alcohol to provide a carboxyl group-containing (meth)acrylic resin and neutralizing a part of carboxyl groups of a reaction product of the resultant carboxyl group-containing (meth)acrylic resin with an alicyclic epoxy group-containing unsaturated compound with a base and adding water thereto, removing the solvent to provide a resin in which the solvent is substituted with water and adding a polymerizable vinyl monomer to the resin.


Inventors:
Maruo, Katsuya
Miyake, Hiroto
Application Number:
JP2002000230125
Publication Date:
March 04, 2004
Filing Date:
August 07, 2002
Export Citation:
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Assignee:
DAICEL CHEM IND LTD
International Classes:
G03F7/027; C08F290/12; G03F7/033; (IPC1-7): C08F290/12; G03F7/027; G03F7/033
Attorney, Agent or Firm:
三浦 良和