Title:
METHOD FOR PRODUCING COATED FILM FORMATION COMPOSITION FOR LITHOGRAPHY
Document Type and Number:
Japanese Patent JP2022015957
Kind Code:
A
Abstract:
To provide a method for producing a coated film formation composition for lithography used in a lithography process in semiconductor manufacture which is reduced in a moisture content, and a cleaning method of an ion exchange resin which is reduced in a moisture content for producing the same.SOLUTION: A method for producing an ion exchange resin having a moisture content of 5 wt.% or less includes a liquid passage step of an organic solvent having a moisture content of 150 ppm or less to an ion exchange resin precursor having a moisture content of 40 wt.% or more, and dehydration efficiency=(dehydration ratio(%)/(used weight of organic solvent per unit weight of ion exchange resin precursor(kg/kg)×cleaning time(h))) is 5 or more, and the moisture content is 5 wt.% or less. A method for producing a coated film formation composition for lithography includes a step of subjecting a coated film formation composition precursor for lithography to ion exchange treatment using the ion exchange resin.SELECTED DRAWING: None
Inventors:
OYA TAKUMI
YAMAGUCHI DAIKI
SASA TAKU
YAMAGUCHI DAIKI
SASA TAKU
Application Number:
JP2020119163A
Publication Date:
January 21, 2022
Filing Date:
July 10, 2020
Export Citation:
Assignee:
NISSAN CHEMICAL CORP
International Classes:
B01J47/016; B01J39/05; B01J39/07; B01J39/20; G03F7/11
Attorney, Agent or Firm:
Patent business corporation Tsukuni
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