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Title:
METHOD FOR PRODUCING COMPOSITION CONTAINING CYCLODEXTRIN INCLUSION COMPOUND
Document Type and Number:
Japanese Patent JP2013040230
Kind Code:
A
Abstract:

To provide a method for producing a composition containing cyclodextrin inclusion compound which can prevent or reduce alteration or elimination of a guest compound even if the cyclodextrin inclusion compound is in contact with water.

The method for producing a composition containing cyclodextrin inclusion compound includes: a first step for contacting an inclusion compound obtained by making the guest compound to be included in cyclodextrin and an amphiphilic polymer compound in an aqueous phase to form a hydrous first composition; and a second step for dehydrating the first composition formed in the first step and obtaining solid containing the inclusion compound.


Inventors:
YOSHII HIDEFUMI
KIMURA SHINICHI
YAMAMOTO TOMOAKI
TANIGUCHI HIROBUMI
YAMAGUCHI YUKIO
YOSHIDA SHINICHI
TERADA NAOFUMI
Application Number:
JP2011176153A
Publication Date:
February 28, 2013
Filing Date:
August 11, 2011
Export Citation:
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Assignee:
TOTTORI INST OF IND TECHNOLOGY
TANIGUCHI WASHI KK
NIPPON NOGYO SHIZAI KK
International Classes:
C08L3/02; A61K8/73; A61Q13/00; C08B37/16; C08K5/00; C08L101/14; D21H17/06; D21H17/28
Domestic Patent References:
JP2008514198A2008-05-08
JPH07207165A1995-08-08
JPS62194824A1987-08-27
JP2008214285A2008-09-18
JPH07504080A1995-05-11
JP2003518515A2003-06-10
JP2003532757A2003-11-05
JP2008514198A2008-05-08
JPH07207165A1995-08-08
Attorney, Agent or Firm:
Hidetoshi Kasahara