Title:
化合物、樹脂、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP6803665
Kind Code:
B2
Abstract:
A compound represented by formula (I): wherein R1 represents a hydrogen atom or a methyl group; R2 represents a C1-C12 hydrocarbon group; Xa and Xb each independently represent an oxygen atom or a sulfur atom; X11 represents a C1-C12 divalent saturated hydrocarbon group where a hydrogen atom can be replaced by a fluorine atom; and A1 represents a C1-C12 divalent saturated hydrocarbon group or *-A2-X1-(A3-X2)a-A4-, where * represents a binding site to an oxygen atom, A2, A3 and A4 each independently represent a C1-C12 divalent hydrocarbon group, X1 and X2 each independently represent —O—, —CO—O—, —O—CO— or —O—CO—O—, and “a” represents 0 or 1.
Inventors:
Tatsuro Masuyama
Suzuki Yuki
Koji Ichikawa
Suzuki Yuki
Koji Ichikawa
Application Number:
JP2016026582A
Publication Date:
December 23, 2020
Filing Date:
February 16, 2016
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D321/06; C08F20/22; C08F20/26; G03F7/004; G03F7/038; G03F7/039
Domestic Patent References:
| JP2051509A | ||||
| JP2012107204A | ||||
| JP2003335773A | ||||
| JP2006152255A | ||||
| JP11015164A | ||||
| JP2000509075A | ||||
| JP4323209A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation