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Title:
METHOD FOR PRODUCING CYCLOHEXANOL AND/OR CYCLOHEXANONE
Document Type and Number:
Japanese Patent JP2003261484
Kind Code:
A
Abstract:

To provide a method for producing cyclohexanol and/or cyclohexanone by which the cyclohexanol and/or cyclohexanone can be produced under mild conditions with high selectivity and good productivity.

This method for producing the cyclohexanol and/or cyclohexanone comprises bringing cyclohexane into contact with molecular oxygen in the presence of a heteropoly acid compound containing silicon, tungsten and one ruthenium in the heteropoly acid skeleton and oxidizing the cyclohexane. A heteropoly acid anion in the heteropoly acid compound preferably has a composition represented by Si1W11Ru1O39 (wherein, Si, W, Ru and O denote each silicon, tungsten, ruthenium and oxygen).


Inventors:
MIZUNO TETSUTAKA
YAMAGUCHI KAZUYA
Application Number:
JP2002063211A
Publication Date:
September 16, 2003
Filing Date:
March 08, 2002
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
B01J31/02; C07B61/00; C07C27/12; C07C29/50; C07C35/08; C07C45/33; C07C49/403; (IPC1-7): C07C29/50; B01J31/02; C07C27/12; C07C35/08; C07C45/33; C07C49/403
Attorney, Agent or Firm:
Takashi Kuboyama (2 outside)