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Title:
シクロヘキサノンおよびシクロヘキサノールの製造方法
Document Type and Number:
Japanese Patent JP2008528537
Kind Code:
A
Abstract:
The present invention relates to a process for preparing cyclohexanone and cyclohexanol, said process comprising (a) neutralising acids and/or carbon dioxide present in an organic solution further comprising cyclohexylhydroperoxide by mixing the organic solution with a first aqueous base solution at a temperature of from 50 to 80° C. to form a first mixture comprising a first aqueous phase with a pH of from 8.5 to 13 and a first organic phase, (b) separating first aqueous phase from the first mixture resulting in a remaining mixture comprising first organic phase, (c) decomposing cyclohexylhydroperoxide present in said remaining mixture by mixing said remaining mixture with a second aqueous base solution at a temperature of from 60 to 110° C. to form a second mixture comprising a second aqueous phase and a second organic phase comprising cyclohexanone and cyclohexanol, (d) separating the second aqueous phase from the second organic phase at a temperature higher than 80° C.

Inventors:
Weat, rally, walker
Application Number:
JP2007552605A
Publication Date:
July 31, 2008
Filing Date:
January 17, 2006
Export Citation:
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Assignee:
DSM IP ASSETS B.V.
International Classes:
C07C27/00; C07C27/26; C07C29/00; C07C35/08; C07C45/51; C07C49/603
Domestic Patent References:
JPH09194408A1997-07-29
JPH07247230A1995-09-26
JP2005528455A2005-09-22
JPS54135748A1979-10-22
JPH0525069A1993-02-02
JP2002128714A2002-05-09
Attorney, Agent or Firm:
Yuichi Yamada
Masakazu Noda
Yoshinori Shimizu