To provide an electromagnetic wave shielding material which comprises a transparent substrate and a fine line pattern formed thereon.
A physical development nuclei layer is preliminarily formed on a transparent substrate; a silver halide emulsion layer is applied thereon; a light-sensitive material having the physical development nuclei layer and the silver halide emulsion layer on the transparent substrate in this order is exposed with an optional fine line pattern; physical development is carried out in an alkali solution in the presence of a soluble silver complex salt-forming agent and a reducing agent; metal silver is precipitated with an optional fine line pattern onto the physical development nuclei layer by physical development; the layer provided on the physical development nuclei layer is removed to expose the physically developed metal silver fine line on the surface; and the metal is electroplated or electroplated as well as electroless plated with the use of the physically developed metal silver fine line as a catalytic nucleus.
SUZUKI JUNJI
TSUBAKII YASUO
KOBAYASHI KAZUHISA
MITSUBISHI PAPER MILLS LTD
| JPH04282639A | 1992-10-07 | |||
| JPH07134421A | 1995-05-23 | |||
| JPH11232939A | 1999-08-27 | |||
| JP2000040896A | 2000-02-08 | |||
| JP4429901B2 | 2010-03-10 |
| WO2004007810A1 | 2004-01-22 |
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