Title:
エーテル化合物の製造法
Document Type and Number:
Japanese Patent JP4048171
Kind Code:
B2
Abstract:
Preparation of an ether compound (II) comprises reacting a compound containing a hydroxy with an alkenyl ether compound (I). Preparation of an ether compound containing a group of formula (II) comprises reacting a compound containing a hydroxy group with an alkenyl ether compound of formula (I). [Image] R 1-R 3alkyl, aryl or aralkyl all optionally substituted; or R 1+R 2cycloalkyl. Independent claims are also included for: (i) the preparation of an ether compound containing a group of formula (IIA) comprising reacting a compound containing a carboxy with a compound (I); and (ii) the use of (II) and a photo oxidation agent in chemical amplication type resist compositions. [Image].
Inventors:
Ikuo Shimizu
Katsuhiro Ito
Kazuma Nagata
Aki Yamaoka
Katsuhiro Ito
Kazuma Nagata
Aki Yamaoka
Application Number:
JP2003512181A
Publication Date:
February 13, 2008
Filing Date:
July 12, 2002
Export Citation:
Assignee:
Kyowa Hakko Chemical Co., Ltd.
International Classes:
C07C41/54; C07B51/00; C07C43/303; C07C43/305; C07C67/04; C07C69/54; C08F20/26; G03F7/039; C07B61/00
Domestic Patent References:
| JP2000298344A |
Attorney, Agent or Firm:
Kazuyuki Iwahashi