Title:
含フッ素スルホニルフルオリドの製造方法
Document Type and Number:
Japanese Patent JP4770461
Kind Code:
B2
Abstract:
The present invention provides a process for producing a fluorinated sulfonyl fluoride useful as e.g. a material for an ion exchange resin, and a novel chemical substance useful as an intermediate in the production process. That is, to provide a process comprising oxidizing Y-S-R A -E-R B by means of an oxidizing agent essentially containing a halogen atom to obtain XSO 2 -R A -E-R B , and in a case that X is a fluorine atom, reacting the compound with fluorine in a liquid phase as it is, and in a case that X is a halogen atom other than a fluorine atom, converting X into a fluorine atom, and then reacting the obtained compound with fluorine in a liquid phase to obtain FSO 2 -R AF -E F -R BF , and then decomposing it to obtain FSO 2 -R AF -COF (wherein R A is a bivalent organic group such as an alkylene group, R B is a monovalent organic group such as a perfluoroalkyl group, E is -CH 2 OCO-, Y is a monovalent organic group such as a cyano group or the like, X is a halogen atom, R AF is a bivalent organic group having R A fluorinated or the like, R BF is the same group as R B or the like, and E F is -CF 2 OCO-).
Inventors:
Koichi Murata
Takashi Okazoe
Eisuke Murotani
Takashi Okazoe
Eisuke Murotani
Application Number:
JP2005511422A
Publication Date:
September 14, 2011
Filing Date:
July 02, 2004
Export Citation:
Assignee:
Asahi Glass Co., Ltd.
International Classes:
C07C303/22; C07C209/84; C07C303/02; C07C303/16; C07C309/82; C07C309/84
Domestic Patent References:
JP2003012634A | 2003-01-15 | |||
JPS6036454A | 1985-02-25 | |||
JPH11335346A | 1999-12-07 | |||
JPS5692263A | 1981-07-25 |
Foreign References:
WO1998043952A1 | 1998-10-08 | |||
WO2002044138A1 | 2002-06-06 |
Attorney, Agent or Firm:
Shohei Oguri
Hironori Honda
Toshimitsu Ichikawa
Hironori Honda
Toshimitsu Ichikawa