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Title:
METHOD FOR PRODUCING HALOGEN-SUBSTITUTED QUINOLINE DERIVATIVE
Document Type and Number:
Japanese Patent JP2001139554
Kind Code:
A
Abstract:

To provide a method by which a halogen-substituted quinoline derivative can be produced in high yield and high purity according to simple operations.

This method for producing a halogen-substituted quinoline derivative represented by general formula (1) [wherein X1, X2 and X3 denote each a halogen atom; and R1 denotes hydrogen atom or a lower alkyl group] is characterized as carrying out a reaction of an aniline derivative represented by general formula (2) (wherein X1, X2 and X3 are each the same as described above) with an aldehyde derivative represented by general formula (3) R1CH= CHCHO (3) (wherein R1 is same as described above) in the presence of an acid in the interface between water and a nonaqueous solvent in the method for producing the halogen-substituted quinoline derivative represented by general formula (1) comprising reacting the aniline derivative represented by general formula (2) with the aldehyde derivative represented by general formula (3).


Inventors:
MATSUGI MASATO
NAMIKAWA JUNICHI
TAFUSA FUJIO
Application Number:
JP31903599A
Publication Date:
May 22, 2001
Filing Date:
November 10, 1999
Export Citation:
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Assignee:
OTSUKA PHARMA CO LTD
International Classes:
C07D215/18; (IPC1-7): C07D215/18
Attorney, Agent or Firm:
Eiji Saegusa (8 others)