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Title:
高純度活性珪酸水溶液の製造方法
Document Type and Number:
Japanese Patent JP3691047
Kind Code:
B1
Abstract:

To provide a method for producing a high purity active silicic acid aqueous solution containing metallic impurities in an extremely small content, for having high effectiveness to remove metallic impurities contained in an alkali silicate.

The method for producing the high purity active silicic acid aqueous solution comprises obtaining an active silicic acid aqueous solution including a chelating agent containing nitrogen atom or phosphorous atom by mixing the chelating agent and an active silicic acid aqueous solution or mixing the chelating agent and an alkali silicate aqueous solution and then bringing the alkali silicate aqueous solution containing the chelating agent into contact with an H-type cation exchanger to obtain the active silicic acid aqueous solution containing the chelating agent, and bringing the active silicic acid aqueous solution including the chelating agent into contact with an anion exchanger.

COPYRIGHT: (C)2006,JPO&NCIPI


Inventors:
Kuniaki Maejima
Shinsuke Miyabe
Masahiro Izumi
Application Number:
JP2004222730A
Publication Date:
August 31, 2005
Filing Date:
July 30, 2004
Export Citation:
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Assignee:
Nippon Chemical Industry Co., Ltd.
International Classes:
B01J41/04; B01J41/12; C01B33/148; (IPC1-7): C01B33/148; B01J41/04; B01J41/12
Domestic Patent References:
JP2003514742A
JP4002606A
Attorney, Agent or Firm:
Kenji Akatsuka
Yasuo Fukuda