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Title:
METHOD FOR PRODUCING HIGH SILICON STEEL STRIP BY GAS SILICONIZING TREATING METHOD
Document Type and Number:
Japanese Patent JP2001107218
Kind Code:
A
Abstract:

To stably produce a high silicon steel strip in which the concentration of Si in the sheet width direction is uniform without generating the breaking of the steel strip and edge cracking by a continuous gas siliconizing treating method.

In a method for continuously producing a high silicon steel strip by a gas siliconizing treating method, a steel strip in which the edge parts in the sheet width direction are coated with a material preventing or suppressing siliconizing is subjected to siliconizing treatment, by this method, a high silicon steel strip in which the Si concentration of the edge parts in the sheet width direction in which edge cracking is easy to be generated is locally reduced, and having a uniform high Si concentration as for the parts in the sheet width direction other than the same can be obtained, thus, by cutting away only the edge parts in the sheet width direction of the produced high silicon steel strip, the product of the high silicon steel strip having a uniform Si concentration in the sheet width direction can be obtained.


Inventors:
ISHIOKA MUNEHIRO
MASUDA SADAKAZU
OKADA KAZUHISA
KASAI KATSUJI
TAKADA YOSHIICHI
FUJITA KOICHIRO
Application Number:
JP27945999A
Publication Date:
April 17, 2001
Filing Date:
September 30, 1999
Export Citation:
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Assignee:
NIPPON KOKAN KK
International Classes:
C23C10/04; C21D1/72; C23C10/08; (IPC1-7): C23C10/04; C21D1/72; C23C10/08
Attorney, Agent or Firm:
Tomomachi Masatoshi