Title:
使用済みルテニウム(Ru)ターゲットを用いた高純度化及び微細化されたルテニウム(Ru)粉末の製造方法
Document Type and Number:
Japanese Patent JP5526282
Kind Code:
B2
Abstract:
The present invention relates to a method for preparing fine ruthenium powder having higher purity from a waste ruthenium target, wherein the object of the method is to overcome the disadvantages of using conventional wet preparation methods for preparing powder, including high costs and long preparation time due to a complicated preparation process, and environmental problems for treating waste water with acids. In order to address the problems, the present invention provides a method comprising the following steps: chemically or physically removing contaminant sources on the surface of a waste ruthenium target; mounting the surface-treated waste ruthenium target on the interior of a plasma chamber and controlling a plasma torch; reducing pressure using a vacuum device and forming a plasma; preparing a powder having higher purity; and fine-grinding the powder to obtain fine ruthenium powder having higher purity.
Inventors:
Yun Won Kyu
Yang Seung Ho
Hong Gilsu
Yang Seung Ho
Hong Gilsu
Application Number:
JP2013501180A
Publication Date:
June 18, 2014
Filing Date:
March 15, 2011
Export Citation:
Assignee:
HEE SUNG METAL LTD.
International Classes:
C22B11/02; B22F9/04; C22B1/00; C22B7/00; C23C14/34
Domestic Patent References:
| JP2001342506A | ||||
| JP3026331A | ||||
| JP2005307229A | ||||
| JP2009108400A | ||||
| JP2002332528A | ||||
| JP2000034563A |
Foreign References:
| US20020130041 | ||||
| US6379419 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi