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Title:
METHOD FOR PRODUCING NITRIDE CRYSTAL AND APPARATUS FOR PRODUCING CRYSTAL
Document Type and Number:
Japanese Patent JP2012136423
Kind Code:
A
Abstract:

To provide a method for producing a nitride crystal, with which reuse of a reaction vessel is made possible by preventing breakage of the reaction vessel, and with which a high-quality crystal is obtained, in growing the nitride crystal with an ammonothermal method.

After a raw material and an ammonia solvent are filled in the reaction vessel and sealed therein, the reaction vessel is set up in a pressure-tight vessel having a valve, and further after a second solvent is filled in the void between the pressure-tight vessel and the reaction vessel and the pressure-tight vessel is tightly sealed, the nitride crystal is grown in a supercritical and/or a subcritical ammonia atmosphere in the reaction vessel. In this case, the pressure difference between the outside and the inside of the reaction vessel is adjusted so as to be small via the valve.


Inventors:
FUJISAWA HIDEO
MIKAWA YUTAKA
Application Number:
JP2011283116A
Publication Date:
July 19, 2012
Filing Date:
December 26, 2011
Export Citation:
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Assignee:
MITSUBISHI CHEM CORP
International Classes:
C30B29/38; C01B21/06; C30B7/10
Domestic Patent References:
JP2010507562A2010-03-11
JP2005008444A2005-01-13
Foreign References:
WO2010079814A12010-07-15
Attorney, Agent or Firm:
Patent Service Corporation Patent Office Sykes