ノニオン性化合物、樹脂、レジスト組成物及びレジストパターンの製造方法

Title:

ノニオン性化合物、樹脂、レジスト組成物及びレジストパターンの製造方法

Document Type and Number:

Japanese Patent JP6721319

Kind Code:

B2

Abstract:

A compound which is non-ionic compound, the compound has a group represented by formula (Ia): wherein R2 represents a group having a C3 to C18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, Rf1 and Rf2 each independently represent a C1 to C4 perfluoroalkyl group, and * represents a binding site.

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Inventors:

Tatsuro Masuyama
Yuichi Mukai
Koji Ichikawa

Application Number:

JP2015226026A

Publication Date:

July 15, 2020

Filing Date:

November 18, 2015

Export Citation:

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Assignee:

Sumitomo Chemical Co., Ltd.

International Classes:

C08F20/28; C07C69/54; C07C69/75; C07C69/753; C07C69/757; G03F7/004; G03F7/038; G03F7/039; G03F7/20

Domestic Patent References:

JP2012021143A
JP2013041256A
JP2014002355A
JP2010134012A
JP2010134006A

Attorney, Agent or Firm:

Shinki Global IP Patent Corporation

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