METHOD FOR PRODUCING PATTERN IN POLYMER LAYER - COMMISSARIAT ENERGIE ATOMIQUE

Title:

METHOD FOR PRODUCING PATTERN IN POLYMER LAYER

Document Type and Number:

Japanese Patent JP2008290230

Kind Code:

A

Abstract:

To provide a method for producing patterns using a polymer by a method which is easy to carry out and is cheaper to industrialize than a conventional technique.

Polymer sites are formed on a support (2). These sites undergo a plasma deposition of a dielectric material (3), and preferably react with this plasma so as to form openings (6) at the level of the sites. As the result, a pattern structure is formed in the dielectric material (3) and/or in the polymer (4).

More Like This:

JP4601292	Nanoscaling ordering of hybrid materials using genetically engineered medium-scale viruses
JP5189894	Surface-modified carbon nanotubes and compositions containing them

Inventors:

GAILLARD FREDERIC-XAVIER
VANDROUX LAURENT

Application Number:

JP2008119944A

Publication Date:

December 04, 2008

Filing Date:

May 01, 2008

Export Citation:

Click for automatic bibliography generation Help

Assignee:

COMMISSARIAT ENERGIE ATOMIQUE

International Classes:

B82B3/00; H01L21/027

Domestic Patent References:

JPS642008A	1989-01-06
JPS6459817A	1989-03-07

Foreign References:

US4599243A	1986-07-08
US20070134916A1	2007-06-14

Attorney, Agent or Firm:

Kenji Yoshitake
Hidetoshi Tachibana
Yasukazu Sato
Hiroshi Yoshimoto
Yasushi Kawasaki
Hakozaki Yukio

Previous Patent: DEVICE AND METHOD FOR CHAMFERING METALLIC MATERIAL

Next Patent: LOADING DEVICE FOR POLISHING END SURFACE OF WORKPIECE