Title:
METHOD FOR PRODUCING POLYMER, RADIATION-SENSITIVE RESIN COMPOSITION, AND METHOD FOR PRODUCING THE SAME
Document Type and Number:
Japanese Patent JP2022134462
Kind Code:
A
Abstract:
To provide a radiation-sensitive resin composition that can exhibit sensitivity, LWR performance, pattern rectangularity and the like, at a sufficient level, and has improved defects; a method for producing the same; and a method for producing a polymer to be used for the same.SOLUTION: The method for producing the polymer includes subjecting a monomer having a phenolic hydroxyl group or a protected form thereof to free-radical polymerization in the coexistence of a polymerization initiator to obtain the polymer. The free-radical polymerization is continuously performed in a unidirectional flow state from an introduction part to a discharge part, in a flow pass which includes the introduction part, the discharge part, and a heating part provided between the introduction part and the discharge part.SELECTED DRAWING: None
Inventors:
MARUYAMA KEN
YAMASHITA TATSUYA
FUKUNAGA TOMOKI
YAMASHITA TATSUYA
FUKUNAGA TOMOKI
Application Number:
JP2021033592A
Publication Date:
September 15, 2022
Filing Date:
March 03, 2021
Export Citation:
Assignee:
JSR CORP
International Classes:
C08F220/16; G03F7/039
Attorney, Agent or Firm:
Patent Business Corporation Unias International Patent Office
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