Title:
METHOD FOR PRODUCING POLYPROPYLENE-BASED RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2006037052
Kind Code:
A
Abstract:
To provide a method for producing polypropylene-based resin composition containing a silicon dioxide-based antiblocking agent having 5.0-8.0 μm average particle diameter, wherein the polypropylene-based resin composition has excellent effects sufficiently suppressing blocking property of films formed thereof and preventing defective appearance caused by fish eye.
The method for producing polypropylene-based resin composition containing a silicon dioxide-based antiblocking agent having 5.0-8.0 μm average particle diameter is provided, wherein the polypropylene-based resin composition is obtained by adding a silicon dioxide-based antiblocking agent to an ≥80°C polypropylene powder.
Inventors:
KIMOTO KAZUSHI
NISHIDA YUICHI
NISHIDA YUICHI
Application Number:
JP2004223440A
Publication Date:
February 09, 2006
Filing Date:
July 30, 2004
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C08L23/10; B29B9/12; C08K3/36; B29K23/00
Attorney, Agent or Firm:
Takashi Kuboyama
Toru Nakayama
Masayuki Enomoto
Toru Nakayama
Masayuki Enomoto
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