Title:
反応性ポリシロキサン溶液の製造方法
Document Type and Number:
Japanese Patent JP5527433
Kind Code:
B2
Abstract:
The present invention is a method for manufacturing a reactive polysiloxane solution, the method comprising: a condensation process for hydrolyzing and copolycondensing a starting compound containing an organosilicon compound having a reactive functional group selected from a (meth)acryloyl group and an oxetanyl group, and also having a siloxane bond-forming group to synthetize a reactive polysiloxane represented by general formula (1); a dissolution process for dissolving the obtained reactive polysiloxane in an organic solvent for water washing; and a washing process for bringing the obtained organic solution and water in contact with each other to remove the water layer from the mixed liquid. The organic solvent for water washing that is used is a compound (e.g., propylene glycol mono butyl ether, 1-pentanol) including a hydroxyl group, having a boiling point at 1 atm of 110° C.-200° C., and a solubility of 10 g or less in 100 g of water at 20° C.
Inventors:
Naomasa Furuta
Akinori Kitamura
Akinori Kitamura
Application Number:
JP2012550818A
Publication Date:
June 18, 2014
Filing Date:
December 14, 2011
Export Citation:
Assignee:
Toagosei Co., Ltd.
International Classes:
C08G77/06; C08G77/14; C08G77/20; C08G77/34; C08F299/08
Domestic Patent References:
| JP2004162060A | 2004-06-10 | |||
| JP2005126592A | 2005-05-19 | |||
| JP2003321545A | 2003-11-14 | |||
| JP2004162060A | 2004-06-10 | |||
| JP2005126592A | 2005-05-19 | |||
| JP2003321545A | 2003-11-14 |
Foreign References:
| WO2012090707A1 | 2012-07-05 |