To provide a method for producing a high purity hydrogen peroxide solution by refining a hydrogen peroxide solution containing silicon oxide impurities to remove the impurities as much as possible.
A flocculant is added to a hydrogen peroxide solution containing silicon oxide impurities, solid impurities contained in the hydrogen peroxide solution are filtered out with a precision filter, and the resulting hydrogen peroxide solution is brought into contact with a chelate resin converted to a fluoride ion type with at least one fluorine compound selected from the group comprising sodium fluoride, potassium fluoride and ammonium fluoride having ≤0.05 wt.% SiF6 content to remove the silicon oxide impurities contained in the hydrogen peroxide solution.
WATANABE SADAHIRO
YAMAMOTO AKIHISA
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