Title:
レジスト組成物の製造方法
Document Type and Number:
Japanese Patent JP6466650
Kind Code:
B2
Abstract:
This is to provide a process for manufacturing a resist composition which can prepare a resist composition lowered in coating defects, and
the manufacturing process is a process for manufacturing a resist composition to be used in a process for manufacturing a semiconductor apparatus, the process comprising the steps of:
cleaning a manufacturing apparatus for a resist composition with a cleaning solution;
analyzing the cleaning solution taken out from the manufacturing apparatus;
repeating the step of cleaning and the step of analyzing until a concentration of metal components contained in the cleaning solution becomes 5 ppb or less; and
manufacturing the resist composition by using the manufacturing apparatus after the step of repeating.
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Inventors:
Tsutomu Ogiwara
Motoaki Iwabuchi
Motoaki Iwabuchi
Application Number:
JP2014076653A
Publication Date:
February 06, 2019
Filing Date:
April 03, 2014
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/26; C08G8/04; G03F7/075; G03F7/11
Domestic Patent References:
| JP2013112705A | ||||
| JP2014024831A | ||||
| JP2004053886A | ||||
| JP2007072357A | ||||
| JP2013137869A | ||||
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Attorney, Agent or Firm:
Mikio Yoshimiya
Toshihiro Kobayashi
Toshihiro Kobayashi