Title:
SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2021183599
Kind Code:
A
Abstract:
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF), an acid generator, and a resist composition containing the same.SOLUTION: A salt represented by formula (I), an acid generator, and a resist composition are provided. [In the formula, R1 and R2 each represent -O-L1-CO-O-R10 or the like; L1 represents an alkanediyl group; R4, R5, R7 and R8 each represent a halogen atom, a fluorinated alkyl group or a hydrocarbon group, provided that the hydrocarbon group may have a substituent and -CH2- contained in the hydrocarbon group may be substituted with -O-, -CO- or the like; R10 represents a group having a lactone structure; X1 and X2 each independently represent an oxygen atom or a sulfur atom; m1 represents an integer of 1-5, m2 and m8 each represent an integer of 0-5, and m4, m5 and m7 each represent an integer of 0-4, provided that 1≤m1+m7≤5 and 0≤m2+m8≤5; and AI- represents an organic anion.]SELECTED DRAWING: None
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Inventors:
KOMURO KATSUHIRO
MUKAI YUICHI
ICHIKAWA KOJI
MUKAI YUICHI
ICHIKAWA KOJI
Application Number:
JP2021081315A
Publication Date:
December 02, 2021
Filing Date:
May 12, 2021
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D307/00; C07C309/12; C07D321/10; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation