Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP6706955
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a production method of a resist pattern having good line edge roughness.SOLUTION: A salt is provided, which has an anion having a group represented by formula (Ia) and a cation represented by formula (IC). In the formulae, Xand Xeach independently represent O or S; Xrepresents a divalent saturated hydrocarbon group having at least one F; * represents a bonding site; Rand Reach independently represent H, a hydroxy group or a hydrocarbon group, in which -CH- included in the group may be replaced by -O- or -CO-; m and n each independently represent 1 or 2; Ar represents a substituted/unsubstituted aromatic hydrocarbon group or a substituted/unsubstituted hetero aromatic hydrocarbon group.SELECTED DRAWING: None
Inventors:
Yukako Adachi
Koji Ichikawa
Koji Ichikawa
Application Number:
JP2016074954A
Publication Date:
June 10, 2020
Filing Date:
April 04, 2016
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D319/14; C07D321/06; C07D321/12; C07D339/08; G03F7/004; G03F7/038
Domestic Patent References:
| JP2012097074A | ||||
| JP2014199389A | ||||
| JP2014006491A | ||||
| JP2002236358A | ||||
| JP2015107957A | ||||
| JP2015107956A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation