Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP6730072
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a salt, an acid generator, a resist composition and the like, from which a resist pattern can be produced with good CD uniformity (CDU).SOLUTION: The salt includes a group represented by formula (aa), preferably formula (aa1) in a cation. In the formula, Xand Xeach independently represent an oxygen atom or a sulfur atom; Xrepresents a divalent saturated hydrocarbon group having 1 to 12 carbon atoms and having at least one fluorine atom; * represents a bonding site; and ring W represents an alicyclic hydrocarbon group having 3 to 36 carbon atoms, in which a methylene group included in the alicyclic hydrocarbon group may be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group, a hydrogen atom included in the alicyclic hydrocarbon group may be represented by a hydroxy group or a hydrocarbon group having 1 to 12 carbon atoms, and a methylene group included in the hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.SELECTED DRAWING: None
Inventors:
Yukako Adachi
Koji Ichikawa
Koji Ichikawa
Application Number:
JP2016085869A
Publication Date:
July 29, 2020
Filing Date:
April 22, 2016
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D321/10; C07C309/12; C07C309/17; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2015060034A | ||||
| JP2005104956A | ||||
| JP2011037837A | ||||
| JP2014088367A | ||||
| JP2012097074A | ||||
| JP2012107204A |
Other References:
Kitazume, T.et al.,Reactions of f-propene and its dimer with sodium dialkyldithiocarbamate,Journal of Fluorine Chemistry,1978年,Vol.12,Issue3,PP.193-202
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation