塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Title:

塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Document Type and Number:

Japanese Patent JP6789034

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a salt, an acid generator, a resist composition and the like, from which a resist pattern can be produced with good CD uniformity.SOLUTION: The salt is represented by formula (I); and the acid generator and the resist composition comprise the salt. In the formula, Rand Reach independently represent a hydrogen atom, a hydroxy group or a hydrocarbon group; m and n each independently represent 1 or 2; Ar represents an aromatic hydrocarbon group or a hetero aromatic hydrocarbon group which may have a substituent; Arepresents a (1+s)-valent aliphatic saturated hydrocarbon group which may be substituted with a hydroxy group; Rrepresents an alicyclic hydrocarbon group which may be substituted with a hydroxy group, in which two hydrogen atoms included in the alicyclic hydrocarbon group may be each replaced by an oxygen atom, and the two oxygen atoms may be integrated together with an alkanediyl group to form a ketal ring which may include a fluorine atom; and s represents an integer of 1 to 3.SELECTED DRAWING: None

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Inventors:

Tatsuro Masuyama
Koji Ichikawa

Application Number:

JP2016163712A

Publication Date:

November 25, 2020

Filing Date:

August 24, 2016

Export Citation:

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