塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Title:

塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Document Type and Number:

Japanese Patent JP6850597

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a salt capable of producing a resist pattern with a good mask error factor (MEF), an acid generator, and a resist composition containing the acid generator.SOLUTION: The salt having a group represented by formula (aa1), the acid generator, and the resist composition are provided. [In the formula (aa1), Rrepresents a 1-12C hydrocarbon group; Xand Xeach independently represent an oxygen atom or a sulfur atom; Xrepresents a divalent 1-12C saturated hydrocarbon group which may have a fluorine atom; Arepresents-X-(A-X)-A-; Aand Aeach independently represent a divalent 1-12C hydrocarbon group; Xand Xeach independently represent -O-, -CO-O-, -O-CO-, or -O-CO-O-; a represents 0 or 1; and * represents a bond.]SELECTED DRAWING: None

Inventors:

Yukako Adachi
Koji Ichikawa

Application Number:

JP2016243627A

Publication Date:

March 31, 2021

Filing Date:

December 15, 2016

Export Citation:

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