Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP6991792
Kind Code:
B2
Abstract:
A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1 and R2 independently each represent a hydrogen atom, a fluorine atom or a C1-C6 perfluoroalkyl group, z represents an integer of 0 to 6, X1 represents *-C(=O)-O-, *-O-C(=O)-, *-O-C(=O)-O- or -O-, where * represents a binding site to -C(R1)(R2)- or -C(Q1)(Q2)-, A1 represents a C2-C36 divalent hydrocarbon group in which a methylene group can be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom can be replaced by a substituent, R3 represents a hydrogen atom or a methyl group, and Z+ represents an organic cation.
Inventors:
Yoshida Isao
Koji Ichikawa
Koji Ichikawa
Application Number:
JP2017163202A
Publication Date:
February 03, 2022
Filing Date:
August 28, 2017
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C309/17; C07C309/12; C07C381/12; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2010191015A | ||||
| JP2012108496A | ||||
| JP2013520458A | ||||
| JP2008545789A | ||||
| JP2016050302A |
Foreign References:
| US20110217654 |
Attorney, Agent or Firm:
Fukami patent office