Title:
塩、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP6974981
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a salt capable of producing a resist pattern with good CD uniformity (CDU), a resist composition containing the same, and a method for producing a resist pattern.SOLUTION: There are provided a salt represented by formula (I), an acid generator, a resist composition, and a method for producing a resist pattern. [In the formula, Q, Q, Qand Qeach independently represent a fluorine atom or a C1-6 perfluoroalkyl group; Land Leach independently represent a C1-24 divalent saturated hydrocarbon group; -CH- contained in the saturated hydrocarbon group may be substituted with -O- or -CO-; a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group; Xrepresents a divalent group having a base-dissociable group; and Z1and Z1'each independently represent an organic cation.]SELECTED DRAWING: None
Inventors:
Satoshi Yamamoto
Takahiro Yasue
Koji Ichikawa
Takahiro Yasue
Koji Ichikawa
Application Number:
JP2017160419A
Publication Date:
December 01, 2021
Filing Date:
August 23, 2017
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C309/17; C07C381/12; C07D327/06; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2018039794A | ||||
| JP2018059050A | ||||
| JP2014051488A | ||||
| JP2015024989A | ||||
| JP2013174857A | ||||
| JP2014215548A | ||||
| JP2008013551A | ||||
| JP2015206932A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation