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Title:
METHOD FOR PRODUCING SILICATE PHOSPHOR
Document Type and Number:
Japanese Patent JP2005272831
Kind Code:
A
Abstract:

To provide a method for producing silicate phosphor exhibiting high luminance.

The invention relates to the method for producing silicate phosphor by firing a mixture of metal compounds containing silicon oxide, wherein firing is carried out after impregnating a halogen compound into the mixture containing silicon oxide with 10 m2/g of BET specific surface area. The invention relates to the method for producing the silicate phosphor by adding at least one selected from a group comprising Eu and Mn as an activator to a compound expressed by general formula; mM1O-nM2O-2SiO2 (in the formula M1 is at least one selected from a group comprising Ca, Sr and Ba, M2 is at least one selected from a group comprising Mg and Zn. m is more than 0.5 and less than 3.5, n is more than 0.5 and less than 2.5).


Inventors:
NAKAMURA YOSHIKO
ONO KEIJI
MIYAZAKI SUSUMU
Application Number:
JP2005048410A
Publication Date:
October 06, 2005
Filing Date:
February 24, 2005
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C09K11/08; C09K11/59; H01J11/22; H01J11/34; H01J11/42; H01J61/44; (IPC1-7): C09K11/08; C09K11/59; H01J11/02; H01J61/44
Domestic Patent References:
JP2004131677A2004-04-30
JPH02283791A1990-11-21
JPH03149286A1991-06-25
JP2003183644A2003-07-03
JPS646087A1989-01-10
JPH04293990A1992-10-19
JPS56155280A1981-12-01
JPS5210880A1977-01-27
Foreign References:
WO2002083814A12002-10-24
Attorney, Agent or Firm:
Takashi Kuboyama
Toru Nakayama
Masayuki Enomoto



 
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