Title:
METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS MEMBER
Document Type and Number:
Japanese Patent JP3152410
Kind Code:
B2
Abstract:
PURPOSE: To obtain a synthetic quartz glass member free from OH groups and chlorine and suitable as a material for semiconductor jigs by grinding synthetic quartz glass, heating the ground glass at a specific temperature under vacuum, and subsequently thermally melting the glass at a prescribed elevated temperature.
CONSTITUTION: A silicon compound such as SiCl4 or Si(OCH3)4 as a raw material is treated by a flame hydrolysis reaction, a plasma flame cracking method, etc., or hydrolyzed by a sol-gel method, and the produced silica fine particles are melted to produce synthetic quartz glass. The obtained synthetic quartz glass is ground preferably into a particle size of ≤600μm, subsequently heated at 1000-1200°C under vacuum for evaporating the adsorbed water, and further thermally melted at 1500-1900(to obtain the synthetic quartz glass member free from OH groups and chlorine. The obtained synthetic quartz glass member has a strain point of ≥1130°C, an annealing point of ≥1220°C, and a high temperature viscosity not below that of natural quartz glass.
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Inventors:
Takeshi Aoyama
Hisashi Otsuka
Masatoshi Takita
Hisashi Otsuka
Masatoshi Takita
Application Number:
JP7556394A
Publication Date:
April 03, 2001
Filing Date:
April 14, 1994
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C03B20/00; C03B8/00; C03B19/01; C03B19/09; C03B19/10; C03C3/06; (IPC1-7): C03B20/00; C03C3/06
Domestic Patent References:
| JP337120A | ||||
| JP2124739A | ||||
| JP2180723A | ||||
| JP446020A | ||||
| JP597466A |
Attorney, Agent or Firm:
Ryoichi Yamamoto (1 person outside)