To deposit a thin film of a superconductor having a high critical current density in the method of producing a thin film by a vapor deposition method such as a laser abrasion method.

In the method of producing a thin film where a target is irradiated with a high energy line to generate a plume and also to scatter grains from the target, and the scattered grains are deposited on a substrate confronted with the target, the center of the substrate lies inside a rotor formed in such a manner that the prescribed region shown in the figure 1 in an X-Y coordinate system with the irradiation position of the high energy line on the target as the origin, the line connecting the irradiation position and the plume tip as the Y axis and the line orthogonal to the Y axis in the irradiation position as the X axis, is rotated with the Y axis as the center.