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Title:
METHOD FOR PRODUCTION OF DIAMOND AND APPARATUS THEREFOR
Document Type and Number:
Japanese Patent JP3208792
Kind Code:
B2
Abstract:

PURPOSE: To improve productivity bye base materials on both sides of thermion radiating materials, diminishing the spacings therebetween, enclosing the circumference with cooling plates and passing gaseous raw materials to effect reaction by a hot filament CVD method.
CONSTITUTION: The thermion radiating materials (e.g. tungsten wire having 0.3mm diameter) are used by perpendicularly extending these materials on the same plane. The spacings therebetween are set dense at the ends and coarse at the center to uniformize a temp. distribution. The distances between the base materials to be deposited with diamond (e.g.: polycrystalline silicon subjected to mirror finishing then to scratching treatment) 7 and the thermion radiating materials 10 are set within 40mm. Buffer materials (e.g. Mo plate having about 25mm thickness) 6 in common use as trays support the base materials 7 and are fixed to cooling plates 8, 9. The diamond is synthesized at a high speed of several tens μm/hour by maintaining the pressure in a reaction vessel 1 at 1 to 760Torr, the temp. of the thermion radiating materials 10 at 1600 to 2600°C and the surface temp. of the base materials at 400 to 1200°C and introducing gaseous raw materials essentially consisting of a carbon source and hydrogen source (e.g. hydrogen contg. 3vol.% ethanol) into the reaction chamber.


Inventors:
Akihiko Ikegaya
Naoji Fujimori
Application Number:
JP17676291A
Publication Date:
September 17, 2001
Filing Date:
July 17, 1991
Export Citation:
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Assignee:
Sumitomo Electric Industries, Ltd.
International Classes:
C30B29/04; C23C16/27; C23C16/44; C23C16/52; C30B25/10; (IPC1-7): C30B29/04; C23C16/27
Domestic Patent References:
JP3115576A
Attorney, Agent or Firm:
Akira Uchida (2 outside)



 
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