Title:
六塩化二ケイ素の精製方法
Document Type and Number:
Japanese Patent JP5157441
Kind Code:
B2
Abstract:
The objective of the present invention is to provide a method for obtaining a high purity disilicon hexachloride by removing a silanol with good efficiency from a disilicon hexachloride material containing the silanol as an impurity. The purification method for disilicon hexachloride of the presnt invention comprises a process for contacting a disilicon hexachloride material containing disilicon hexachloride and a silanol as an impurity with an adsorbent material such as activated carbon to remove the silanol. The method may further comprise a distillation process. The above processes are preferably performed in an atmosphere of an inert gas.
Inventors:
Koji Ishikawa
Hiroshi Suzuki
Yoshinori Kizen
Hiroshi Suzuki
Yoshinori Kizen
Application Number:
JP2007512438A
Publication Date:
March 06, 2013
Filing Date:
March 17, 2006
Export Citation:
Assignee:
Toagosei Co., Ltd.
International Classes:
C01B33/107
Domestic Patent References:
| JPH02153815A | 1990-06-13 | |||
| JPS61275125A | 1986-12-05 |
Foreign References:
| GB923784A | 1963-04-18 | |||
| WO2002012122A1 | 2002-02-14 | |||
| GB923784A | 1963-04-18 |
Attorney, Agent or Firm:
Kiyoshi Kojima
Yoshinobu Hagino
Yoshinobu Hagino