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Title:
METHOD FOR PURIFYING POLYAMIDE RESIN
Document Type and Number:
Japanese Patent JP2009102660
Kind Code:
A
Abstract:

To provide a method for purifying polyamide resin that can obtain polyamide resin having a small quantity of ionic impurities and usable as a material in a field which requires a high degree of electrical insulating property.

The method for purifying polyamide resin comprises processes for adding a basic compound in a polyamide solution with polyamide resin dissolved in a solvent, then adding a poor solvent of polyamide resin to deposit polyamide resin, and carrying out washing with water, filtering and drying. The quantity of ionic impurities can be easily reduced in this method.


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Inventors:
SHIMURA KATSUNORI
MOGI SHIGERU
ICHIMURA SUMIO
Application Number:
JP2009028379A
Publication Date:
May 14, 2009
Filing Date:
February 10, 2009
Export Citation:
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Assignee:
NIPPON KAYAKU KK
International Classes:
C08G69/46
Domestic Patent References:
JPH08127654A1996-05-21
JPH06329791A1994-11-29
JPH04253728A1992-09-09
JPH03234722A1991-10-18
JPH0347836A1991-02-28
JPS5260846A1977-05-19
JPH04236227A1992-08-25
JPH04236226A1992-08-25
JPH05125182A1993-05-21
JP2002097282A2002-04-02



 
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