To provide a technique for extremely reducing inorganic impurities in an unsaturated fluorinated carbon compound since more reduction in impurities in raw material gas is required in the field of semiconductor production, electronic and electric parts, etc.
An unsaturated fluorinated carbon compound having extremely reduced inorganic impurities such as nitrogen, oxygen, etc., is obtained by packing an unsaturated fluorinated carbon compound into a pressure vessel such as a cylinder, etc., and extracting gas from a vapor-phase part in a state compressed to specific pressure or above. Preferably the unsaturated fluorinated carbon compound is brought into contact with a calcined metal oxide besides the gas extraction operation from the vapor-phase part. The water content in the unsaturated fluorinated carbon compound is extremely reduced by bringing the compound into contact with the calcined metal oxide.
SUGIMOTO TATSUYA
YAMADA TOSHIRO
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